Annealing furnace / Diffusion furnace/LPCVD furnace
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Annealing furnace / Diffusion furnace/LPCVD furnace
Details Heating zone 6"~12"dia x 48L for wafer 4~8" Wafer, highest temperature: 1200C, temperature control accuracy 1°C, three zone heating, computer control, automatic temperature control (lifting temperature, constant temperature) and vacuum control Pressure and arm in and out, can be customized to set the temperature setting program, and can adjust the PID parameters to reach the optimal set temperature point
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